Nanomass Gas Density

MEMS科氏力质量流量计

The device for continuous gas density measurement in the process. Highly accurate density and concentration measurement of non‐corrosive, inflammable, non‐inflammable gases and gas mixtures.

High process safety and product quality – permanent process monitoring in real time. Increased process efficiency – continuous measurement and fast response time. High availability – maintenance‐free. Integrated pressure and temperature measurement. Different hazardous area approvals available.

Complete data transparency – integrated data logger. Excellent price/performance ratio – multivariable measurement (temperature, pressure, concentration). Reliable – insensitive to vibrations. 2‐line backlit display with push buttons.

DN 0.7 (1/36")

Micro channel:
Silicon; Schott Borofloat 33
Manifold
1.4542 (17‐4 PH)
Connection:
Swagelok, 1.4404 (316L)
Pressure sensor:
1.4404 (316L)
O‐ring: Viton
Process membrane: Ceramics (AI2 O3)

Density, temperature, pressure, reference density, average molar mass,concentration

Density (gas): ±0.1 kg/m³
Temperature: ± 0.5°C
Pressure: ± 0.02 bar

0 to 30 kg/m³ (0 to 0.03 g/cm3, 0 to 0.03 SGU)

20 bar (290 psi)

–20 to +60 °C (–4 to +140 °F)

–20 to +60 °C (–4 to +140 °F)

Powder‐coated aluminium

Standard: IP65/67

2‐line backlit display with push buttons
Configuration via local display and operating tools possible
USB or RS232 interface

2 outputs:
4‐20 mA (passive)

None

DC 8 to 28 V

ATEX, IECEx, UL C/US Cl. I